PROGRAM
OF 3rd SUNBEAM WORKSHOP
September 5 (
Industrial Consortium for Material
Research (SUNBEAM)
supported
by Japan Synchrotron Radiation Research Institute (JASRI) and Industrial Users
Society of SPring-8
Organizing
Chair: Yasushi UEHARA, Mitsubishi Electric Corporation
Opening address: Shiro
NAKAMURA, Chair of the working committee of SUNBEAM, Mitsubishi Electric
Corporation
Opening remarks: Akira KIRA, Director General of JASRI
SESSION I: Materials/Energy/Environmental
Session chair:
Recent Applied Research of Synchrotron
Radiation in
Takashi WATANABE, KOBELCO RESEARCH Institute, Inc.
A Study for Dislocation-Free Plastic Deformation
Mechanism in a New Beta Type Ti Alloy
Yoshiki SENO,
XAFS Analysis of Ceria Based Electrolytes Doped
with Lanthanide Oxides
Hiroshi DEGUCHI, Kansai Electric Power Co., Inc.
Local Atomic and Electronic Structures of
Pt Catalysts Using EXAFS
Kenji KOBAYASHI, Fundamental Res. Labs., NEC Corp.
Local Structure Analysis of Germanium in
the Optical Fiber.
Junji IIHARA, Sumitomo Electric Industries, Ltd.
Lunch
break (
Invited lecture
Chair:
Visualizing Single Domains and Domain Walls with
X-Rays
Eric D. ISAACS, Director, Semiconductor Physics Research,
SESSION II: Electronics A
Session chair:
Structural Analysis of
Takao MIYAJIMA, Sony Corporation Core Technology & Network Company
Peak Separation of In-plane Diffraction
Patterns from Cu/NiFe Thin Film Using Anomalous Dispersion Effect.
Kazuhiro UEDA, Hitachi Ltd.
Grazing Incidence X-Ray Diffraction of
Longitudinal and Perpendicular Magnetic Recording Media for HDD
Michio OHSAWA,
Crystallographic Characterization of
Poly-Si Thin Films
Junichi NISHINO, SANYO Electric Co. Ltd.
Coffee
break
SESSION III: Electronics B
Session chair:
Synchrotron X-Ray Topography Measurements on
4H-SiC Epitaxial Layer
Isaho KAMATA, Central Research Institute of Electric
Power Industry
Structural Evaluation of Gate-Oxide/Si Interface by X-Ray CTR Scattering
Shuichi DOI, Fujitsu Laboratories Ltd.
Shinji OZAKI, Matsushita Technoresearch Inc.
X-Ray Reflectivity Study on the Density
and the Roughness of Silicon Oxide Thin Films under Various Fabirication
Condisions.
Kazumasa KAWASE, Mitsubishi Electric Corporation
X-Ray Reflectivity Study of Hafnium Silicate
Thin Films Prepared by Thermal Chemical Vapor Deposition
Hideyuki YAMAZAKI, Toshiba Corporation
Closing address: Tokio
OHTO, Vice-chair of the working committee of SUNBEAM, Fuji Electric Corporate
R& D, Ltd.
